Technical Parameter

  Zinc oxide (ZnO) is a good substrate for GaN thin film. It has large exciton binding energy of 60 meV and a bandwidth of 3.73 eV at room temperature, making it a luminescent material for ultraviolet and visible light. Due to the transparency in the visible region, the large electromechanical coupling coefficient and the properties of adsorption and desorption of gas molecules on its surface, it is expected to be used in energy limiters with high peak energy, GaN substrates with large size and high quality, and wireless communications which beyond 5GHz in the future, high electric field equipment, high temperature and high energy electronic devices etc..

  Properties

    

Structure

Hexagonal

Lattice Constant

a=3.252Å    c=5.313 Å

Density

5.7(g/cm3)

Method for Growth

Hydrothermal

Hardness (Mho)

4(mohs)

Melting Point

1975℃

Thermal Expansion Coefficient

6.5 x 10-6 /℃//a     3.7 x 10-6 /℃//c

Specific Hear

0.125 cal /g.m

Thermal-electric constand

1200 mv/k @ 300 ℃

Heat Conductivity

0.006 cal/cm/k

Transmission Range

0.4-0.6 um > 50% at 2mm

 

  PRODUCT DATA SHEET OF OPTOELECTRONICS MATERIALS

    

Crystal Orientation

<0001>、<11-20>、<10-10>±0.5º

Size(mm)

25×25×0.5mm、10×10×0.5mm、10×5×0.5mm、5×5×0.5mm

Custom-made size upon request

Surface Roughness

<=5A

Atm Force Microscopy(AFM) report can be provided

Polishing

Single polishing or double polishing

Package

Class 100 clean bag, Class 1000 super clean room

 

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